ALD/CVD Precursors
Targeting today's leading-edge semiconductor applications, Dow's ALD/CVD precursor materials are ideal for metal, copper and electrode deposition on semiconductor structures using ALD and CVD processes. These high-purity precursors are delivered in cylinders for ease of use and provide exceptional control to meet process requirements, resulting in high growth rates and excellent step coverage.
Dow Electronic Materials brings industry-leading expertise to the ALD/CVD market, with more than 40 years of experience in developing and supplying CVD precursors and other electronic materials for the semiconductor and compound semiconductor industries along with decades of experience working closely with industry leaders.
Available Products
Nickel Precursor
Lanthanum Precursor
Cobalt Precursor
Manganese Precursor