Dow Electronic Materials
Bottom Anti-Reflectant Coating (BARC) - AR™ 10L
Product Category: Below Resists: oBARC--KrF BARC
AR™ 10L is an organic, thermally cross-linking bottom anti-reflectant coating (BARC) for 248 nm (KrF) photoresist. It is designed to provide a universal anti-reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP HYBRID and Acetal resists. AR™ 10L is a conformal 1st min., 248 nm anti-reflectant and is typically used in the range of 400-1200A over transparent thin films on reflective substrates.
Features
- Approximate optical density=9abs/um
- Conformal coating
- Universal resist compatibility
- 1st min film thickness=600A over reflective dielectrics
- Compatible with common spin-coating and EBR solvents
- Fast etching rate, typically 30-40% faster than DUV series photoresists
150 nm 1:1 Lines/Spaces
150 nm Isolated Line
190 nm 1:1 Lines/Spaces
170 nm 1:1 Lines/Spaces