Dow Electronic Materials
ArF Dry L/S Resist
Product Category: Resists
Positive tone 193 nm dry resist has been optimized for trench and line and space applications through pitch.
Features
- 90 nm 1:1 line and space
- 90 nm ISO line
Benefits
- Very large PW at various pitches
- Excellent profile
- Good ID bias
- Good etch resistance
1a: 90 nm L/90 nm S
90 nm ISO L