Dow Electronic Materials
ArF Immersion C/H Resist
Product Category: Resists
Positive tone 193 nm immersion resist has an excellent process window, CD uniformity and low defectivity. Also, it can reduce process costs as it doesn’t require use of a topcoat.
Features
- 65 nm / 120 nm pitch dense contact hole
- 65 nm / 180 nm pitch semi-dense contact hole
- 65 nm ISO contact hole
Benefits
- Excellent DOF margin
- Excellent CD uniformity
- Low defectivity
- Topcoat-free process
- Excellent profile shape
65nm DOM (66nm/120P)
65nm DOM (66nm/180P)
65nm DOM (70nm/500P)