Dow Electronic Materials
Immersion Lithography Topcoat
Product Category: Topcoat
Dow Topcoat is designed for 193 nm immersion lithography. It is designed for use in single patterning and advanced patterning technologies at the 45 nm node and below. The high receding contact angle is designed specifically for next generation immersion scanners.
Features
- Suitable for all feature sizes generated by 193 nm immersion lithography
Benefits
- Compatible with most 193 nm photoresists
- Low defectivity for line & space and contact hole applications
- Higher receding contact angle for fast scan speeds
- Very low leaching
- Low dispense volume with no pre-wet
Dow Topcoat on Dow ArF resist