Peter Trefonas, Ph.D., is interviewed in the SPIE TV video
Chemistry is Key Player in Lithography Process.
SPIE, the international society for optics and photonics, interviewed our own Peter Trefonas, Ph.D., at the 2016 SPIE Advanced Lithography Conference, to learn about his career and his experiences in the changing field of photolithography. The video interview is now available on SPIE TV. SPIE TV is home to video interviews, podcasts and SPIE conference coverage, and showcases many leading voices in the industry.
Trefonas is a corporate fellow in Electronic Materials at The Dow Chemical Company. In this new video, "Chemistry is Key Player in Lithography Process," he discusses the developments in lithography across his 30+ years in the field. Photoresist technology and anti-reflective coatings are some of the technologies where Trefonas made seminal contributions.
"Chemistry plays a key role in the enablement of microlithography," Trefonas said in the video. "And because of that, the enablement of the progress of integrated circuits and electronics, and for that matter, the entire information age."
Looking to the future of photolithography, Trefonas comments on new technologies extending 193nm lithography and predicts that photoresist developments will enable extreme ultraviolet (EUV) technology. Experience has taught him that each wavelength change creates what seem like insurmountable challenges for chemistry. Yet new chemistries will be introduced, creating new advances in materials including underlayers, topcoats and ancillary process materials.
"The roadmap in front of us has less clarity than it used to have," Trefonas said in the interview. "There are many options to resolving the challenges in front of us, and some of these options are complementary and some are exclusionary… I think there’s going to be an increasing emphasis on chemical solutions that give further extension to 193 immersion lithography."
Watch the Full Video on SPIE TV