Dow Electronic Materials
Dow’s VISIONPAD™ Polishing Pad Series
Dow’s OPTIVISION™ 4540 CMP Polishing Pads are designed to address market demand for a low defectivity, low cost of ownership (COO) pad that delivers consistent performance over a long pad lifetime. The OPTIVISION™ 4540 Pad is formulated with a unique polymer chemistry and pore structure to help minimize defectivity while providing higher removal rates in applications where traditional soft pads are used.
OPTIVISION™ 4540 CMP Polishing Pad Benefits:
- Significant reduction in scratch and chattermark defectivity when compared to POLITEX™ pad products, resulting in higher yields
- Increase in several types of removal rates, including TEOS when compared to POLITEX™ pads, resulting in higher throughput
- Consistent superior performance over a long pad lifetime, allowing for greater tool uptime and reduced COO
The OPTIVISION™ 4540 Pad is available in multiple sizes and configurations for a variety of applications where traditional soft pads are used. Large diameters, windows for end point detection and advanced grooving are all available options. This product is ready for immediate sampling.